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Robert Brainard received his B.S. in Chemistry from U.C. Berkeley in 1979. He studied the reaction mechanisms of organoplatinum compounds during his graduate studies with Professor Whitesides at MIT and Harvard University. After receiving his Ph.D. in 1985, he studied the reaction mechanisms on copper and silver surfaces under ultrahigh vacuum conditions as a post-doctoral student with Professor Madix at Stanford University. Robert worked for Polaroid 1987-1990 and worked at Shipley/Rohm & Haas 1990-2005, where he did product development research in the areas of: electrodeposited, dielectric, color filters, DUV, EUV, X-ray and e-beam photoresists. Robert was the first chemist in the world to design resists for EUVL, starting in 1998 while working at Shipley Company and in collaboration with the EUV LLC. Robert is now a tenured Professor at the College of Nanoscale Science and Engineering within SUNY Polytechnic Institute investigating new materials for use in EUV lithography and biological applications.
• EUV photoresist exposure mechanisms • High quantum efficiency EUV photoresists • Design and synthesis of photoacid generators • Acid amplifiers for use in EUV Lithography • Design and synthesis of photoimageable hydrogels for cell growth • Molecular Organometallic Resists for EUV