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Dr. Oxana V. Kharissova (born in 1969 in Ukraine, former USSR, has lived in Mexico from 1995, and naturalized in Mexico in 2004) is currently a Professor and Researcher at the Universidad Autónoma de Nuevo León (UANL). Degrees: M.Sc. in 1994, in crystallography from Moscow State University, Russia, and a Ph.D. in Materials from the Universidad Autónoma de Nuevo León, Mexico. Memberships: National Researchers System (SNI, Level II), Materials Research Society, Mexican Academy of Science. She is the co-author of five books, 12 book chapters, 83 articles, and holds eight patents. Specialties: Materials, nanotechnology (carbon nanotubes, graphene, nanostructurized metals, fullerenes), microwave irradiation and crystallography; nanotechnology-based methods for petroleum treatment. Dr. Kharissova holds the awards “Flama, Vida y Mujer 2017” and “Tecnos” (2004). She is an expert of the National Council for Science & Technology of Mexico (Conacyt).
• EUV photoresist exposure mechanisms • High quantum efficiency EUV photoresists • Design and synthesis of photoacid generators • Acid amplifiers for use in EUV Lithography • Design and synthesis of photoimageable hydrogels for cell growth • Molecular Organometallic Resists for EUV